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Ion Coater / Sputtering Coater

Manufacture: EIKO Engineering CO., Ltd[Japan]

This apparatus is used for TEM/SEM specimen preparation with ease of operation.

   

Features

This apparatus is used for TEM/SEM specimen preparation with ease of operation. By generating a glow discharge in a vacuum chamber as low as 1.33Pa and ionizing the residual gas, this ion coater can sputter metals on a specimen, clean, and etch a specimen with the energy of the ionized gas.

Application

Vacuum sputtering

Others

Specifications Upper electrode (target) 50mm in diameter (round shape)
Lower electrode 52mm in diameter
Cooling of specimen stage Water cooling
Clearance between target and specimen stage 20mm, 35mm 2 steps
Ionization voltage 0 to 1400V/DC Ionization current 10mA (max) with ammeter
Electrode for coating (optional) Au / Au-Pd / Pt-Pd Vacuum pump RP20L/min (separate setting)

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Contact informationn Advanced Process Machinery Division
  TEL:+81-3-5472-1721
FAX:+81-3-5472-1720
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